CELL과 PERI를 별도 제작하고 Cu·산화막 접합면으로 연결하는 교육용 본딩형 3D NAND입니다. 16개 저장 WL, 별도 SGS·SGD, 네 독립 BL과 공통 Source를 23개 패드로 연결합니다. 치수와 회로는 구조 관찰용으로 확대·축약했습니다. [CBA 공정 원리](https://www.kioxia.com/en-jp/rd/technology/cba.html) **모델 범위** 10×8 µm 영역과 40 nm 격자를 사용합니다. 막 두께는 관찰용으로 확대했으며 NAND 전하 저장·터널링·읽기/쓰기 동작은 계산하지 않습니다. PERI는 23개 신호의 접속을 설명하는 반복 CMOS 출력단입니다. 실제 WL 고전압 구동기·BL 감지 증폭기·CSL 전원망·주소 디코더를 동일한 CMOS 쌍으로 구현했다는 뜻이 아닙니다. 열처리, 접합 강도와 접촉 저항도 계산하지 않습니다.
CMOS 소자를 형성할 웨이퍼 표면 800 nm입니다.
노출된 실리콘 영역의 도핑 종류를 형성합니다. 실제 주입 에너지·활성화·문턱전압은 계산하지 않습니다.
활성 영역을 남기고 주변 실리콘을 200 nm 낮춥니다.
분리 트렌치를 SOG 형상으로 채웁니다.
실리콘 Active와 STI 상면을 맞춥니다.
20 nm 절연막을 구조 관찰용으로 사용합니다.
Gate와 STI 위 Contact 착지부를 함께 형성합니다.
Source·Drain 사이의 채널 위에 Gate만 남깁니다.
Gate 아래 산화막은 보존하고 노출 실리콘의 주입면을 엽니다.
노출된 실리콘 영역의 도핑 종류를 형성합니다. 실제 주입 에너지·활성화·문턱전압은 계산하지 않습니다.
노출된 실리콘 영역의 도핑 종류를 형성합니다. 실제 주입 에너지·활성화·문턱전압은 계산하지 않습니다.
노출된 실리콘 영역의 도핑 종류를 형성합니다. 실제 주입 에너지·활성화·문턱전압은 계산하지 않습니다.
노출된 실리콘 영역의 도핑 종류를 형성합니다. 실제 주입 에너지·활성화·문턱전압은 계산하지 않습니다.
Gate 측벽과 상면을 감쌉니다.
수평면 질화막을 제거하고 Gate 측벽을 절연합니다.
Gate와 Active를 절연막에 매립합니다.
단자 중심만 열어 채널과 Gate 절연막을 보호합니다.
CVD W 접점 충전의 형상 근사입니다.
W 플러그 사이의 필드 금속을 제거합니다.
두 Gate의 입력 경로와 각 Source·Drain 착지부를 만듭니다.
Gate 입력은 Drain 출력과 분리합니다. Source 전원 배선은 이 축약 구조의 로컬 단자로 표시합니다.
Gate와 Source 배선 위를 절연한 뒤 두 Drain만 위층으로 올립니다.
NMOS와 PMOS의 Drain 착지부에만 도달합니다.
위층 출력 배선과 Drain을 연결합니다.
서로 다른 신호의 Via를 분리합니다.
Drain 쌍을 각 접합 패드까지 연결합니다.
공통 출력 경로에서 CELL의 해당 WL·BL·선택 Gate 또는 Source로 이어집니다.
출력 경로 사이를 절연막으로 메웁니다.
출력 배선 상면을 노출합니다.
배선 위에 절연막을 형성합니다. 작은 Via만 아래 배선에 닿도록 합니다.
각 본딩 패드 중심에서 아래 배선까지 절연막을 엽니다.
패드 둘레에는 바닥 절연막 80 nm를 남깁니다. 중앙 Via만 하부 배선으로 이어집니다.
얕은 패드와 Via에 Cu를 채웁니다. 교육용 conformal CVD 충전 형상이며 산업용 Cu 전해도금의 반응·Seed·결함 예측을 대신하지 않습니다.
상면의 과잉 Cu를 제거해 23개 패드를 서로 분리합니다. 실제 접합에는 나노미터 수준의 단차 관리가 필요합니다.
저장된 공정 단계: 34
Arpelier is a web-based tool for building and exploring 3D device structures from semiconductor process flows. When you add or modify process steps, the 3D structure is rendered in real time. By building structures freely, you can understand their geometry, review the process, and share your work with colleagues.
For anyone, easy, fast, and together.
Semiconductor technology is difficult, but we believe the tools do not have to be.
How a process flow becomes a 3D structure
Visualizing a semiconductor structure is not simply a matter of making an attractive image. It is a way to understand how a process flow creates geometry, examine the relationship between process and structure, and communicate with others.
PowerPoint shapes and general-purpose drawing tools are useful for depicting geometry, but the causal relationship between process and structure must be constructed and explained separately. To understand a structure properly, it should be possible to follow which materials are deposited, which patterns are formed, and what is etched away or left behind.
Arpelier builds 3D structures from process flows. Each process step is linked to the structure at that point in the sequence, and when the process is changed, the structures that follow change with it. This allows an idea to be checked quickly as a structure and a complex device to be understood step by step as it is formed. The resulting structure can then be explored through Composition, Provenance, Change, or Connect without leaving the process context.
One continuous workflow for understanding, explaining, and sharing structures
Many existing semiconductor tools are built for precise analysis and specialized work. They serve those purposes well, but learning the tool itself can become a barrier for someone who needs to inspect a structure quickly or explain an idea.
Semiconductor technology is already difficult enough. The tools used to understand and explain it should not have to be. Arpelier is designed to be used by anyone, easily, quickly, and together.
Beginners can learn the process and the tool through official examples. Users can share or publish their own projects, allowing them to become learning material or a starting point for someone else’s idea.
Arpelier is not intended to make complex technology look simple. It keeps the technical depth intact while making the work of inspecting, understanding, and explaining it more approachable.
Experience the repeated cycle of process conditions, structural change, review, and feedback
At school, students learn the principles of unit processes such as deposition, etching, and lithography, along with materials and device physics. These foundations remain important in actual research and development.
In practice, however, materials, devices, and unit processes are not treated as separate bodies of knowledge. Engineers continually examine how a process condition changes the structure and how that change may affect device characteristics and subsequent processes. Real R&D advances through a repeating loop: process change → structural change → device characterization → process feedback.
This workflow is rarely experienced directly in a typical curriculum. Students and job seekers—and even people who have studied the field for years—often have to learn the relationship between process flows and structural evolution only after entering industry.
Arpelier does not replace actual process development or detailed physical simulation. Composition, Provenance, Change, and Connect help organize which materials, formation history, structural differences, and connections should be reviewed after a process change. This makes it easier to carry observations from the resulting structure into the next engineering decision and to encounter that R&D workflow earlier.
Arpelier began with a small frustration from the field: “Why does drawing a structure have to be this difficult?” Repetitive manual work and inefficiency remain part of building and explaining structures, not only in research but also in education and technical communication.
We built Arpelier to reduce that friction.
Build structures in the language of process,
make them easy and fast for anyone to use together,
and carry an understanding of process–structure relationships from learning into practice.
Researchers can review process ideas with colleagues, and educators can use projects in lectures and assignments. Beginners can learn through official examples, while public projects allow people to learn from others’ work and discover new ideas.
Our principle is simple: connect people with technology and people with one another, and reduce—even slightly—the bottlenecks in how semiconductor technology is understood, explained, and discussed. That is the direction Arpelier is working toward.
Sign in with Google to use Arpelier.
Arpelier Mobile is in Viewer mode.
Full editing is available on PC.
Tutorials are viewable on PC.
Learn the basics first, then move into the full workspace when you are ready to build.
New here? Learn the basics with a tutorial first.
Save projects, continue your work, and collaborate with others.
Mobile primarily supports Viewer mode.
Resume recently opened projects and official examples.
Resume recently opened projects and official examples.
Recently opened projects.
Projects you own.
Projects you collaborate on with others.
Explore curated reference projects from Arpelier.
Browse public projects.
The terms that govern Arpelier and a clear account of how the Service handles information.
These principles summarize how Arpelier approaches your work, project access, and technical results.
This summary is provided for convenience. The specific rights and obligations below govern your use of the Service.
These Terms explain what Arpelier provides, what we commit to, and the responsibilities that come with using the Service.
Arpelier is a web-based workspace for creating and managing semiconductor process flows, calculating and visualizing resulting structures in 3D, and saving, reviewing, or sharing related projects.
By accessing or using the Service, you agree to these Terms. The Privacy Policy below separately explains how personal information and project data are handled.
Visitors may explore official examples, Explore, and Public projects available to them without signing in. Guest access does not provide an account-based private workspace.
Signing in is required for cloud saving, project management, collaboration, sharing controls, and other account-based features. The features available without an account may change as the Service evolves.
You retain the rights you hold in projects, process flows, masks, descriptions, images, settings, and other content you create or upload. Arpelier does not claim ownership of User Content.
You grant Arpelier a limited, non-exclusive permission to host, store, process, render, synchronize, transmit, share, secure, maintain, and recover User Content only as needed to operate the Service, apply your settings, provide features you request, and meet legal obligations. This permission does not transfer ownership.
Private User Content is not licensed to Arpelier for general advertising, public marketing, or public AI-model training. You must have the rights and permissions needed for content you upload or share and must not infringe intellectual property, privacy, confidentiality, or other rights.
Arpelier displays the meaning of each visibility setting in the Service and applies the setting you choose.
Before making a project Public, enabling Show in Explore, or sharing a link, review both the setting and the content included. Changing these settings expands the audience that can access the project.
Arpelier processes project data as described in the Privacy Policy and does not make Private projects available to general users. Even so, the Service uses external cloud infrastructure and a Private setting does not replace your legal authority or an approval required by your organization.
Arpelier is designed to help people visualize, understand, teach, sketch, review, and communicate relationships between semiconductor processes and structures.
We calculate and visualize structures from process inputs and continue improving the accuracy and usefulness of our models and algorithms. Arpelier is not a professional TCAD or manufacturing-validation system and does not reproduce every physical or chemical phenomenon or manufacturing variation.
Displayed or generated results do not guarantee actual manufacturability, process yield, device performance, reliability, safety, or fitness for a particular purpose.
Use independent professional judgment, experiments, detailed simulations, and appropriate validation before making important research, design, investment, safety, or manufacturing decisions.
We may change, limit, or temporarily suspend features for service improvement, maintenance, security, technical, legal, or operational reasons.
If a change materially affects users or an extended interruption is expected, we will provide notice when reasonably practicable. Advance notice may not be possible for urgent outages, security incidents, legal requirements, or events beyond reasonable control.
If the Service is discontinued, we will, when reasonably practicable, give advance notice and time to review or retrieve data using the features then available. This is not a promise of a particular export format or a guarantee that recovery will always be possible.
The commitments above describe how Arpelier operates, but no internet or modeling service can eliminate every interruption, error, security risk, or data-loss risk.
These limitations do not apply to Arpelier’s intentional misconduct or gross negligence, or to any liability that applicable law does not allow to be excluded or limited.
We may update these Terms to reflect changes in the Service or applicable law. The effective date will be shown on this page, and material changes will be announced within the Service or through another reasonable channel.
Questions about these Terms may be sent to contact@arpelier.com.
These Terms are governed by the laws of the Republic of Korea. Mandatory local laws that apply to a user remain effective to the extent required.
This Policy explains what information Arpelier handles, why it is needed, who may access it, and how users can make requests.
Depending on how you use the Service, Arpelier may collect or process the following information.
Account and authentication information
Project and collaboration information
Usage, device, and log information
Support information
AI connector requests
Arpelier uses its own service event system, stored in Supabase, for internal operation and quality analysis. The Service also uses browser storage for sign-in state, language, theme and other preferences, and session or anonymous identifiers. Arpelier does not use this information for third-party advertising or sell it to advertising or analytics vendors.
Private projects are not made available to general users. Public projects are available by link, and Public projects with Show in Explore enabled may also appear in public discovery areas.
Authorized operators may access account, project, or log data only when needed for service operation, security or incident response, error investigation, support requested by a user, recovery or migration, abuse prevention, or legal obligations. Access is limited to the people, purpose, and scope reasonably needed for the task.
A project link is added to a support request only when the user selects that option or otherwise provides it. Including a link does not change a project’s visibility or grant access beyond its existing permissions. If additional access or information is needed, Arpelier may ask the user to provide it.
Arpelier relies on the following providers to operate the Service. They may process information only in connection with the functions they provide.
These providers may process information outside your country. The primary Supabase processing region currently configured for Arpelier is Southeast Asia (Singapore). Processing locations and providers may change as infrastructure changes, and material changes will be reflected in this Policy.
Arpelier keeps information only for as long as reasonably needed for the purposes in this Policy. The period depends on the type of information, whether an account or project remains active, operational and security needs, user requests, disputes, and legal requirements.
Deletion may take additional time in provider systems, residual copies, or records that must be retained by law. Arpelier does not promise a fixed backup or residual-copy deletion schedule. Information retained for legal or security reasons is separated or restricted where reasonably appropriate and deleted when that need ends.
Arpelier applies reasonable administrative and technical safeguards, including access controls that distinguish owners, invited collaborators, public access, and authorized operators.
No internet-based service can guarantee absolute security. If a security incident or data loss is confirmed, Arpelier will investigate and take reasonable steps to contain the issue, reduce harm, and provide notices required by applicable law.
Arpelier does not sell personal information and does not disclose it for third-party advertising or ad targeting.
Information may be disclosed to the service providers above, at a user’s direction, to protect the Service and its users, or where required by law. Public project content is disclosed according to the visibility settings selected by its owner.
Subject to applicable law, users may request access to, correction or deletion of, or restriction of processing of their personal information, and may request account deletion. Arpelier may need to verify the requester’s identity and may retain information where law permits or requires it.
Send requests to contact@arpelier.com.
We may update this Policy to reflect changes in law, the Service, or our providers. The effective date will be shown on this page, and material changes will be announced within the Service or through another reasonable channel.
Change history: November 10, 2026 — the AI connector may keep calculated structures for up to one hour so that long calculations can continue, and can make a link, kept for 7 days, that opens a result in Arpelier (sections 1, 4 and 5). November 9, 2026 — added “AI connector requests” to section 1 and the AI connector item to section 5. The version before these took effect on August 5, 2026.
For privacy questions or requests, contact Arpelier at contact@arpelier.com.
Coming Soon...!
This project was made by AI. It may contain mistakes and may differ from the real device.
Hand process design to an AI and watch the structure build up on this screen.
A desktop app, the web, or a browser extension all work. If it can control this tab, it builds the structure right here.
Change the structure name to build something else.
Read the Arpelier guide (arpelier.com/llms.txt), then build a 32-layer vertically stacked 1T1C DRAM.
Check what the AI made before saving. Our guide tells AIs to save only when you ask.